Effect of the Knudsen Number on Transient Times During Chemical Vapor Deposition
نویسندگان
چکیده
منابع مشابه
The Effect of Knudsen Number on Transient Times During Chemical Vapor Deposition
Models for the individual steps used to fabricate integrated circuits (ICs) are of interest in order to improve fabrication efficiency and improve process designs. Here we focus on deposition from the gas stream, in which the dominant species is an inert carrier gas, as it flows across a wafer on which ICs are being fabricated. We model the transport of gaseous species to the surface and hetero...
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Modeling multiscale effects on transients during chemical vapor deposition
Several important manufacturing processes for integrated circuits (ICs) involve the flow of gaseous reactants over the wafer(s) on which the ICs are being made. We discuss a model in which reactive components of the gas phase do not collide; either because there is a dominant carrier species, or the pressure is low enough. The kinetic transport and reaction model consists of a system of transie...
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ژورنال
عنوان ژورنال: International Journal for Multiscale Computational Engineering
سال: 2006
ISSN: 1543-1649
DOI: 10.1615/intjmultcompeng.v4.i3.30